1. Ceramic substrate
Alumina, silicon nitride, aluminum nitride and silicon carbide ceramics have good thermal conductivity, high temperature and corrosion resistance, they can be used to produce substrates, for electronic components and integrated circuit;
2. Ceramic wafer tray
Alumina and silicon carbide ceramics have high temperature resistance, and wear resistance, they can be used to produce tray to carry wafer for various process, such as RTA(Rapid Thermal Annealing), PVD(Physical vapor Deposition), ICP(Inductively Coupled Plasma), CMP(chemical mechanical polish), to get good processing effect and high efficiency;
3. Ceramic vacuum chuck
Alumina and silicon carbide ceramics have good finish surface, with strong absorption force when pumping air is applied, also ceramic vacuum chuck have high temperature resistance, and widely used to absorb and transfer wafer during the production process;
4. Wafer boat and boat bracket
Silicon carbide and quartz have high temperature resistance and good wear resistance, also the density is low and weight is light, they are suitable to produce wafer boat and boat bracket, to carry wafer for diffusion and oxidation treatment in a diffusion furnace.
5. Diffusion furnace tube
Quartz tube has high temperature resistance and excellent thermal stability, it can be used as diffusion furnace tube, for diffusion and oxidation process of semiconductor wafer wafer.